Chemicals, Cleaners

Image Part Number Description / PDF Quantity Rfq
824-1L

824-1L

MG Chemicals

CLEANER ELECTRONICS 945ML/32 OZ

487

824-500ML

824-500ML

MG Chemicals

CLEANER ELECTRONICS 500ML/17 OZ

249

433C-1L

433C-1L

MG Chemicals

D-LIMONENE-INDUSTRIAL STRENGTH

10

8241-945ML

8241-945ML

MG Chemicals

70/30 ISOPROPYL ALCOHOL 945ML BO

17

407C-125ML

407C-125ML

MG Chemicals

AUDIO / VIDEO HEAD CLEANER 1.25M

16

408A-125ML

408A-125ML

MG Chemicals

RUBBER REJUVENATOR

10

8361-P

8361-P

MG Chemicals

CLEANER ADHESIVE REMOVAL 10ML

0

8260-1L

8260-1L

MG Chemicals

SOLVENT ELECT 1 LTR/35 FL OZ

0

Chemicals, Cleaners

1. Overview

Tools chemicals and cleaners refer to specialized chemical formulations designed for surface preparation, maintenance, and precision cleaning in industrial, commercial, and scientific applications. These products enable contaminant removal (e.g., oils, particulates, oxides), surface activation, and material preservation. Their importance spans critical processes in electronics manufacturing, aerospace, automotive, and medical device industries where precision and reliability are paramount.

2. Major Types & Functional Classification

TypeFunctional CharacteristicsApplication Examples
Solvent-based CleanersVolatile organic compounds (VOCs) for rapid oil/grease dissolutionMetalworking fluid removal in automotive assembly
Aqueous CleanerspH-adjusted water-based solutions with surfactants/chelating agentsFlux residue removal in PCB manufacturing
Semi-aqueous CleanersBlends of water-miscible solvents (e.g., glycol ethers)Cleaning of sensitive optical components
Acid/Alkali EtchantsControlled material removal through chemical reactionSurface texturing in semiconductor packaging
Biodegradable CleanersEnzyme/formulated biodegradation of organic contaminantsFood processing equipment sanitation

3. Structure & Composition

Typical formulations contain 3-5 functional components:

  • Base Solvent: Water, hydrocarbons, alcohols, or engineered solvents (e.g., HFE-7100)
  • Surfactants: Reduce surface tension (e.g., nonylphenol ethoxylates)
  • Corrosion Inhibitors: Triazoles or phosphates for metal protection
  • pH Modifiers: Amines (alkaline) or organic acids (acidic formulations)
  • Specialty Additives: Defoamers, dyes, or biocides

Advanced products incorporate nanoscale abrasives for precision polishing or smart release encapsulation systems.

4. Key Technical Specifications

ParameterSignificanceTypical Range
pH ValueDetermines material compatibility1.5-13.0
Flash PointSafety handling classification15-110 C
Surface TensionCleaning efficacy indicator20-72 mN/m
Evaporation RateProcess time optimization0.01-5.0 g/m /min
Residue ContentCritical for electronics applications<1.0 mg/m
Material CompatibilityPrevents substrate degradationPassivation tested

5. Application Fields

  • Electronics: Wafer bump cleaning, solder paste removal
  • Aerospace: Turbine blade chemical milling
  • Medical: Surgical instrument sterilization
  • Energy: Solar panel surface treatment
  • Automotive: E-coat pretreatment lines

Typical equipment integration: Ultrasonic cleaners (Branson 3800), vapor degreasers (MicroCare VDX), and robotic spray systems.

6. Leading Manufacturers & Products

ManufacturerKey ProductApplication Specialty
ChemoursSuva EC SolventLow-GWP precision cleaning
HoneywellVertrel XMAerospace component degreasing
KYZENKYZEN NVT -115No-clean flux removal
ITW ChemtronicsCRC 05100Electronics contact cleaning
BASFBaxxodour ECBiodegradable odor control

7. Selection Recommendations

Key consideration matrix:

  • Contaminant Type: Polar vs. non-polar residues dictate solvent polarity selection
  • Environmental Compliance: VOC content must meet local regulations (e.g., EPA Method 24)
  • Process Integration: Match cleaning cycle time with production line throughput
  • Material Safety: Review ISO 10993 biocompatibility for medical applications
  • Total Cost: Calculate cleaning efficacy per $/unit metric

Example: For copper etching in flex PCB production, select a pH 8.5 aqueous cleaner with 35 mN/m surface tension to prevent over-etching.

8. Industry Trends

Key development directions:

  1. Green Chemistry: 62% YoY growth in bio-based cleaners (Grand View Research, 2023)
  2. Nano-enabled Formulations: Atomic-level cleaning for 5nm semiconductor nodes
  3. Process Analytics: In-situ FTIR monitoring of cleaning bath contamination
  4. Waterless Solutions: Hydrofluoroether (HFE) solvent adoption increasing 18% annually
  5. AI Formulation: Machine learning-optimized surfactant blends reducing R&D cycles by 40%
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