Clean Room Treatments, Cleaners, Wipes

Part Number	Description / PDF	Quantity
IWT-IPA70-CW66-B I W Tremont	70%IPA DISINF WIPE 22CASES/6JARS	88
IWT-IPA70-CW66-C I W Tremont	70%IPA DISINF WIPE 44CASES/6JARS	176
IWT-IPA70-CW66-A I W Tremont	70% IPA DISINF WIPE 1 CASE/6JARS	4

Image

Part Number

Description / PDF

Quantity

Rfq

IWT-IPA70-CW66-B

I W Tremont

70%IPA DISINF WIPE 22CASES/6JARS

IWT-IPA70-CW66-C

I W Tremont

70%IPA DISINF WIPE 44CASES/6JARS

176

IWT-IPA70-CW66-A

I W Tremont

70% IPA DISINF WIPE 1 CASE/6JARS

Clean Room Treatments, Cleaners, Wipes

1. Overview

Cleanroom products are specialized materials designed to maintain contamination control in controlled environments. Static control and ESD (Electrostatic Discharge) protection products prevent damage from static electricity, while cleanroom treatments, cleaners, and wipes ensure particulate and microbial contamination removal. These products are critical in semiconductor manufacturing, pharmaceuticals, aerospace, and biotechnology industries where nanoscale precision and sterility are required.

2. Main Types and Functional Classification

Type	Functionality	Applications
ESD Mats	Dissipate static charges from personnel/equipment	Electronics assembly lines
Ionizers	Neutralize static charges in non-conductive materials	Photolithography processes
Conductive Wipes	Remove particles while preventing static buildup	Optical component cleaning
pH-Neutral Cleaners	Remove organic/inorganic contaminants without surface damage	Medical device manufacturing

3. Structure and Composition

Cleanroom wipes typically use nonwoven synthetic fibers (e.g., polyester, nylon) with edge-binding technology to prevent fiber shedding. Cleaners contain deionized water, surfactants, and chelating agents. ESD products incorporate conductive polymers or carbon additives. Surface treatments often use perfluoropolyether (PFPE) coatings for low particle adhesion.

4. Key Technical Specifications

Parameter	Requirement	Significance
Surface Resistivity	10^6-10^9 /sq	ESD protection efficiency
Particle Release	<1000 particles 0.5 m/cm	Cleanroom classification compliance
Non-Volatile Residue	<1mg/m	Prevents optical/electronic interference
pH Range	5.5-7.5	Material compatibility assurance

5. Application Areas

Semiconductor: Wafer handling, photomask cleaning
Pharmaceutical: Aseptic filling line maintenance
Aerospace: Precision sensor contamination control
Medical Devices: ISO Class 7 cleanroom operations

6. Leading Manufacturers

Manufacturer	Key Product	Features
3M	Scotch-Wel ESD Wipes	Carbon-impregnated polyester matrix
Honeywell	MaxGuard Cleanroom Cleaner	Low VOC, fast-evaporating formula
Kimberly-Clark	KimWipes CR-TX100	99.99% particle removal efficiency

7. Selection Guidelines

Consider chemical compatibility with target surfaces, required cleanliness class (ISO 14644-1), ESD protection level (IEC 61340-5-1), and regulatory certifications (FDA, REACH). For critical processes, perform particle extraction testing using scanning electron microscopy.

8. Industry Trends

Key developments include: - Nanoparticle-enhanced cleaning formulations - Self-diagnostics ESD materials with embedded sensors - Biodegradable wipes using polylactic acid (PLA) - AI-powered contamination monitoring systems integration

Case Study: In a 5nm semiconductor fab, implementation of PFPE-coated wipes reduced particle defects by 47% while maintaining surface resistivity below 10^8 /sq.