Clean Room Swabs and Brushes

Part Number	Description / PDF	Quantity
814-1000 MG Chemicals	SWAB FOAM RECTANGLE HEAD 1000PCS	0
812AS-1000 MG Chemicals	SWAB ANTISTATIC FOAM OVER COTTON	0
855-5 MG Chemicals	BRUSH CLEANING HORSE MED 5PCS	353
810D-15 MG Chemicals	SWAB CHAMOIS DOUBLE ENDED 15PCS	0
810D-500 MG Chemicals	SWAB CHAMOIS DOUBLE ENDED 500PCS	0
810-500 MG Chemicals	SWAB CHAMOIS SINGLE ENDED 500PCS	2
813-50 MG Chemicals	SWAB FOAM SINGLE ENDED 50PCS	42
812-50 MG Chemicals	SWAB FOAM OVR CTTN SNGL END 50PC	195
810-15 MG Chemicals	SWAB CHAMOIS SINGLE ENDED 15PCS	5
812AS-250 MG Chemicals	SWAB ANTISTATIC FOAM OVER COTTON	0
812AS-10 MG Chemicals	SWAB ANTISTAT FOAM OVR CTTN 10PC	34
812-10 MG Chemicals	SWAB FOAM OVR CTTN SNGL END 10PC	635
813-250 MG Chemicals	SWAB FOAM SINGLE ENDED 250PCS	0
813-1000 MG Chemicals	SWAB FOAM SINGLE ENDED 1000PCS	0
814-10 MG Chemicals	SWAB FOAM RECTANGULAR HEAD 10PCS	0
810D-50 MG Chemicals	SWAB CHAMOIS DOUBLE ENDED 50PCS	25
810-50 MG Chemicals	SWAB CHAMOIS SINGLE ENDED 50PCS	0
812-250 MG Chemicals	SWAB FOAM OVR CTTN SGL END 250PC	0
811-100 MG Chemicals	SWAB COTTON DOUBLE ENDED 100PCS	233
813-10 MG Chemicals	SWAB FOAM SINGLE ENDED 10PCS	83

Clean Room Swabs and Brushes

1. Overview

Clean room swabs and brushes are specialized tools designed for contamination control in controlled environments. They play a critical role in removing particulate and electrostatic discharge (ESD) hazards from sensitive surfaces in semiconductor manufacturing, pharmaceutical production, and aerospace engineering. These products must meet stringent ISO 14644-1 and IEST standards for particle generation, chemical compatibility, and electrostatic dissipation.

2. Main Types and Functional Classification

Type	Functional Features	Application Examples
Foam-Tip Swabs	High absorbency, low particle generation, non-abrasive	Optical lens cleaning, precision electronics assembly
Microfiber Brushes	Split-fiber structure for superior particle capture	HEPA filter maintenance, cleanroom wall cleaning
ESD-Neutral Swabs	Conductive carbon fibers, static-dissipative handles	Wafer processing equipment cleaning, PCB assembly
Ultrasonic Clean Brushes	Engineered for compatibility with ultrasonic cleaning systems	Medical device sterilization, semiconductor tooling maintenance

3. Structure and Composition

Typical swabs consist of three primary components: (1) Cleaning medium (foam, microfiber, or nonwoven fabric), (2) Handle material (polypropylene, conductive polymer, or stainless steel), and (3) Bonding agent (solvent-free adhesive for ISO Class 3 environments). Brushes feature filament arrays (nylon with PTFE coating, carbon-infused polypropylene) mounted on ESD-safe polymer bases. All materials undergo outgassing testing per ASTM E595 standards.

4. Key Technical Specifications

Parameter	Acceptance Criteria	Importance
Particle Shedding (0.5 m+)	<10 particles/cm	Maintains ISO Class 3 environment integrity
ESD Decay Time	<1.0 second	Protects ESD-sensitive electronics
Chemical Extractables	<0.01% by weight	Prevents process contamination
Thermal Stability	Operable from -40 C to 121 C	Enables sterilization compatibility

5. Application Fields

Primary industries include: semiconductor fabrication (ASML immersion lithography tools), biopharmaceutical manufacturing (Grade A/B isolators), aerospace (NASA JPL Class 100 cleanrooms), and precision optics (Zeiss electron microscopes). Critical applications involve photomask cleaning, aseptic filling line maintenance, and MEMS device calibration.

6. Leading Manufacturers and Products

Manufacturer	Key Product	Technical Highlights
Texwipe	TX1010 Cleanroom Swabs	Gamma-stable polyester foam, 10^-6 particle count
Aero-Mist	ESD-700 Brush Kit	Carbon-loaded nylon filaments, 10⁸ surface resistance
Bondline	Ultraclean Swabs	Single-bonded PU tip, <1ppm NVR
Kimberly-Clark	KimWipes CR-TX	99.99% isopropyl alcohol compatibility

7. Selection Recommendations

Key considerations include: (1) Surface sensitivity (e.g., 10nm particle removal efficiency for EUV lithography mirrors), (2) Chemical compatibility (resistance to 5% HF acid solutions), (3) ESD requirements (IEC 61340-5-1 compliance), and (4) Lifecycle cost (sterilization reusability vs. single-use economics). For critical applications like 5nm node manufacturing, carbon-fiber reinforced swabs with sub-100nm particle retention are recommended.

8. Industry Trends

Current developments focus on: (1) Nanofiber-based cleaning media with 99.999% BFE efficiency, (2) Smart brushes with embedded sensors for real-time contamination monitoring, (3) Biodegradable polymer handles reducing environmental impact, and (4) Integration with robotic cleaning systems for ISO Class 1 environments. The market is projected to grow at 8.7% CAGR through 2027, driven by 3D NAND flash manufacturing and biopharma single-use systems.