| Image | Part Number | Description / PDF | Quantity | Rfq |
|---|---|---|---|---|
 |
APPLICATOR: HH FILL; SS HANDLE |
0 |
|
|
 |
APPLICATOR: HOG FILL; SS HANDLE |
0 |
|
|
 |
VAC BRUSH; SS FILL; METAL HANDLE |
0 |
|
|
 |
SIZE 4 SQL DAGGER ARTIST; WD HDL |
0 |
|
|
 |
1" FLOW-THRU; NYLON FILL; MALE |
0 |
|
|
 |
SCRATCH BRUSH; SS FILL; WOOD HDL |
0 |
|
|
 |
APPLICATOR: HOG FILL; SS HANDLE |
0 |
|
|
 |
ITW Chemtronics (Chemtronics) |
APPLICATOR CLEANRM 6.7"POLY 50PC |
0 |
|
 |
HL TOOTHBRUSH; HOG FILL; PL HDLE |
0 |
|
|
 |
APPLICATOR: SD NYL FILL; SS HNDL |
0 |
|
|
 |
APPLICATOR: SS FILL; SS HANDLE |
0 |
|
|
 |
16GAUGE; FT LUER LOCK; HOG FILL |
0 |
|
|
 |
HL TOOTHBRUSH; HH FILL; ALUM HDL |
0 |
|
|
 |
MG Chemicals |
SWAB CHAMOIS DOUBLE ENDED 500PCS |
0 |
|
 |
APPLICATOR: THUND FILL; SS HNDLE |
0 |
|
|
 |
SIZE 10 NYLON STRIP BRUSH, 5" HT |
0 |
|
|
 |
SIZE 2/0 SABELINE ARTIST; WD HDL |
0 |
|
|
 |
SCRATCH BRUSH; BRASS FILL; WD HD |
0 |
|
|
 |
5/8" FLOW-THRU; NYLON FILL; MALE |
0 |
|
|
 |
APPLICATOR: HH FILL; SS HANDLE |
0 |
|
Clean room swabs and brushes are specialized tools designed for contamination control in controlled environments. They play a critical role in removing particulate and electrostatic discharge (ESD) hazards from sensitive surfaces in semiconductor manufacturing, pharmaceutical production, and aerospace engineering. These products must meet stringent ISO 14644-1 and IEST standards for particle generation, chemical compatibility, and electrostatic dissipation.
| Type | Functional Features | Application Examples |
|---|---|---|
| Foam-Tip Swabs | High absorbency, low particle generation, non-abrasive | Optical lens cleaning, precision electronics assembly |
| Microfiber Brushes | Split-fiber structure for superior particle capture | HEPA filter maintenance, cleanroom wall cleaning |
| ESD-Neutral Swabs | Conductive carbon fibers, static-dissipative handles | Wafer processing equipment cleaning, PCB assembly |
| Ultrasonic Clean Brushes | Engineered for compatibility with ultrasonic cleaning systems | Medical device sterilization, semiconductor tooling maintenance |
Typical swabs consist of three primary components: (1) Cleaning medium (foam, microfiber, or nonwoven fabric), (2) Handle material (polypropylene, conductive polymer, or stainless steel), and (3) Bonding agent (solvent-free adhesive for ISO Class 3 environments). Brushes feature filament arrays (nylon with PTFE coating, carbon-infused polypropylene) mounted on ESD-safe polymer bases. All materials undergo outgassing testing per ASTM E595 standards.
| Parameter | Acceptance Criteria | Importance |
|---|---|---|
| Particle Shedding (0.5 m+) | <10 particles/cm | Maintains ISO Class 3 environment integrity |
| ESD Decay Time | <1.0 second | Protects ESD-sensitive electronics |
| Chemical Extractables | <0.01% by weight | Prevents process contamination |
| Thermal Stability | Operable from -40 C to 121 C | Enables sterilization compatibility |
Primary industries include: semiconductor fabrication (ASML immersion lithography tools), biopharmaceutical manufacturing (Grade A/B isolators), aerospace (NASA JPL Class 100 cleanrooms), and precision optics (Zeiss electron microscopes). Critical applications involve photomask cleaning, aseptic filling line maintenance, and MEMS device calibration.
| Manufacturer | Key Product | Technical Highlights |
|---|---|---|
| Texwipe | TX1010 Cleanroom Swabs | Gamma-stable polyester foam, 10-6 particle count |
| Aero-Mist | ESD-700 Brush Kit | Carbon-loaded nylon filaments, 108 surface resistance |
| Bondline | Ultraclean Swabs | Single-bonded PU tip, <1ppm NVR |
| Kimberly-Clark | KimWipes CR-TX | 99.99% isopropyl alcohol compatibility |
Key considerations include: (1) Surface sensitivity (e.g., 10nm particle removal efficiency for EUV lithography mirrors), (2) Chemical compatibility (resistance to 5% HF acid solutions), (3) ESD requirements (IEC 61340-5-1 compliance), and (4) Lifecycle cost (sterilization reusability vs. single-use economics). For critical applications like 5nm node manufacturing, carbon-fiber reinforced swabs with sub-100nm particle retention are recommended.
Current developments focus on: (1) Nanofiber-based cleaning media with 99.999% BFE efficiency, (2) Smart brushes with embedded sensors for real-time contamination monitoring, (3) Biodegradable polymer handles reducing environmental impact, and (4) Integration with robotic cleaning systems for ISO Class 1 environments. The market is projected to grow at 8.7% CAGR through 2027, driven by 3D NAND flash manufacturing and biopharma single-use systems.